Applications of µc-SiOx:H as integrated n-layer and back transparent conductive oxide for a-Si:H/µc-Si:H tandem cells

Shin-Wei Liang, Yen-Tang Huang, Hung-Jung Hsu, Cheng-Hang Hsu, Chuang-Chuang Tsai
2014 Japanese Journal of Applied Physics  
We have prepared n-type hydrogenated microcrystalline silicon oxide [µc-SiO x :H(n)] films with oxygen contents from 0 to 37.3 at. % by varying the CO 2 -to-SiH 4 flow ratio in a plasma-enhanced chemical vapor deposition (PECVD) system. By using µc-SiO x :H(n) as an effective replacement for integrated µc-Si:H(n) and indium-tin oxide (ITO), µc-Si:H single-junction and a-Si:H/µc-Si:H tandem cells exhibited significantly improved efficiencies of 6.35 and 10.53%, respectively. The improvement of
more » ... e single-junction and tandem cells mainly arose from the enhancement of long-wavelength optical absorption in µc-Si:H absorbers, which was confirmed by a quantum efficiency instrument showing a markedly enhanced spectral response at wavelengths from 600 to 1100 nm. Moreover, all the PECVD processes, except the metal contact, had an advantage of in situ deposition without breaking vacuum, thereby minimizing contamination of the interface. The simplified cell fabrication can enhance the fill factor, which will benefit industrial production.
doi:10.7567/jjap.53.05fv08 fatcat:7wx6jcbtpzfplinrmmy4qyw2ta