SPIN (Version 3. 83): A Fortran program for modeling one-dimensional rotating-disk/stagnation-flow chemical vapor deposition reactors
of the contractors, subcontractors, or their employees, makes any warranty, express or implied, or assumes a=;f ieqal liability or responsibility for the accuracy, completeness, or eJsef'alness of any Information, apparatus, product, or process disclose¢:, or represents that its use would not Infringe privately owned r;t;ht_. Reference herein to an_" specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply
... stitute or imply its endorsement, recommendation, or favoring by the UnK_.__ States Government, any agency thereof or any of their contractors or subconractors. The views and opinions expressed heret_ do not necessarily state or reflect those of the United States Government, any = agency thereof or any of their contractors or subcontractors. ABSTRACT This report documents the SPIN Fortran computer program that computes species, temperature and velocity profiles, and deposition rates in a steady-state one-dimensional rotating disk or stagnation-point flow chemical vapor deposition (CVD) reactor. The program accounts for finite-rate gas-phase and surface chemical kinetic and multicomponent molecular transport. The governing differential equations form a twopoint boundary value problem. After discretization by a finite difference procedure, the resulting nonlinear algebraic equations are solved by a modified Newton algorithm.