SPIN (Version 3. 83): A Fortran program for modeling one-dimensional rotating-disk/stagnation-flow chemical vapor deposition reactors [report]

M.E. Coltrin, R.J. Kee, G.H. Evans, E. Meeks, F.M. Rupley, J.F. Grcar
1991 unpublished
of the contractors, subcontractors, or their employees, makes any warranty, express or implied, or assumes a=;f ieqal liability or responsibility for the accuracy, completeness, or eJsef'alness of any Information, apparatus, product, or process disclose¢:, or represents that its use would not Infringe privately owned r;t;ht_. Reference herein to an_" specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply
more » ... stitute or imply its endorsement, recommendation, or favoring by the UnK_.__ States Government, any agency thereof or any of their contractors or subconractors. The views and opinions expressed heret_ do not necessarily state or reflect those of the United States Government, any = agency thereof or any of their contractors or subcontractors. ABSTRACT This report documents the SPIN Fortran computer program that computes species, temperature and velocity profiles, and deposition rates in a steady-state one-dimensional rotating disk or stagnation-point flow chemical vapor deposition (CVD) reactor. The program accounts for finite-rate gas-phase and surface chemical kinetic and multicomponent molecular transport. The governing differential equations form a twopoint boundary value problem. After discretization by a finite difference procedure, the resulting nonlinear algebraic equations are solved by a modified Newton algorithm.
doi:10.2172/6248912 fatcat:52zvezzdozesvgiyipmx7celeu