Optical and Structural Properties of ZnO Thin Films Fabricated by SILAR Method

2014 International Journal of Innovative Research in Science Engineering and Technology  
A novel and simple chemical route was used for the deposition of ZnO thin film from aqueous solution of zinc-ammonia complex, integrating the merits of successive ionic layer adsorption and reaction (SILAR) and chemical bath deposition methods. ZnO thin films on glass substrates were deposited with the precursor of zincammonia complex. Characterization techniques of XRD, SEM, EDAX and DRS are used to characterize ZnO thin films. X-ray diffraction study show that the film prepared in this work
more » ... hibits good crystallinity with the hexagonal wurtzite crystalline structure and the preferential orientation along (0 0 2) plane, with a texture coefficient value of ~2.56, average crystallite size of 28.92 nm and with lattice constants a = b = 3.257 Å, c = 5.215 Å. EDAX spectrum indicates that the film consists of zinc and oxygen elements. The optical band gap energy of the thin films is calculated from optical absorption spectrometry using DRS data and the value was found to be direct allowed transition ~3.22 eV. Sequential reaction on the substrate surface under optimized conditions of concentration and pH of the reacting solutions results in the formation of the film. In this study synthesis of ZnO film was made from ammonium zinc complex prepared from zinc nitrate hexahydrate as the starting reagent. The coated films have been characterized by different techniques such as X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), energy dispersive x-rays (EDX) and diffuse reflectance spectroscopy (DRS).
doi:10.15680/ijirset.2014.0310076 fatcat:jg4g5hgzevclzmx5dieiyfyjli