The Influence of Oxygen Pressure on the Photoluminescent Properties of Pulsed Laser Ablated SrAl 2O 4:Eu 2+ , Dy 3+ Thin Films

P. D. Nsimama
2016 American Journal of Optics and Photonics  
SrAl 2 O 4 :Eu 2+ , Dy 3+ thin films were prepared using the pulsed laser deposition (PLD) technique and the variation of morphological, photoluminescence and structural properties with the oxygen pressure were studied. The atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed in the films morphological measurements. The He-Cd 325 nm laser photoluminescence (PL) system and xenon lamp Cary Eclipse fluorescence spectrophotometer were used to collect the
more » ... ce and afterglow data. The elemental and depth profile analysis were done by using Auger electron spectroscopy (AES). SrAl 2 O 4 :Eu 2+ , Dy 3+ thin films gave a stable green emission peak at 523 nm, attributed to 4f 6 5d 1 → 4f 7 Eu 2+ transitions. Superior PL and afterglow (AG) properties were recorded by the film deposited at the intermediate oxygen pressure of 0.38 Torr. The film had a rough surface as revealed by the SEM and AFM images. The AES data consisted of all the main elements in SrAl 2 O 4 :Eu 2+ , Dy 3+ material, i.e. Sr, Al and O and the adventitious carbon (C). The film thickness varied inversely with the oxygen pressure. The variations of Sr/Al ratios with the PL intensity are reported.
doi:10.11648/j.ajop.20160404.11 fatcat:lpizxgenlrhkxmimdk4rwttrum