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Growth Rate Reproducibility for Magnesium Fluoride Films by Sputtering
フッ化マグネシウムのスパッタに関する成膜速度の安定化
2003
Shinku
フッ化マグネシウムのスパッタに関する成膜速度の安定化
Preserved Fulltext
When Magnesium fluoride was sputtered by conventional techniques, molecular dissociation into Mg and F, and thus fluorine deficiency and optical absorption occured. We have found that sputtering in the form of molecules occured at high temperature of the Magnesium fluoride target. We have named this method K-M-S (Keep-Molecules S puttering) .
doi:10.3131/jvsj.46.624
fatcat:aiypexk7urdq7kkzej5gqjqj4e