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Optical Microlithography XIX
Ensuring robust patterning after OPC is becoming more and more difficult due to the continuous reduction of layout dimensions and diminishing process windows associated with each successive lithographic generation. Lithographers must guarantee high imaging fidelity throughout the entire range of normal process variations. To verify the printability of a design across process window, compact optical models similar to those used for standard OPC are used. These models are calibrated fromdoi:10.1117/12.657056 fatcat:5rn3aj47ajg4fedi4ddtmpvtku