Remote PECVD : a Route to Controllable Plasma Deposition

S. E. Alexandrov
1995 Journal de Physique IV : Proceedings  
Some aspects of RF remote plasma enhanced CVD including the main features of the technique, possibilities of overcoming disadvantages typical for conventional plasma processes, and possible directions to improve the remote plasma method are discussed.
doi:10.1051/jphyscol:1995568 fatcat:xkhtrgosx5ghjgxcdy2kxzajvu