Reduction in Sidelobe Level in Ultracompact Arrayed Waveguide Grating Demultiplexer Based on Si Wire Waveguide

Fumiaki Ohno, Kosuke Sasaki, Ayumu Motegi, Toshihiko Baba
2006 Japanese Journal of Applied Physics  
We designed and fabricated 70 × 75 μm 2 arrayed waveguide grating demultiplexer consisting of Si slab and wire waveguides on a silicon-on-insulator substrate. By optimizing the connection between components and the layout of arrayed waveguides, internal light scattering and the increase in phase error were suppressed. As a result, clear demultiplexing characteristics were observed with a channel spacing of 8 nm and a sidelobe level of −22 dB in the wavelength range from 1.5 to 1.6 μm.
doi:10.1143/jjap.45.6126 fatcat:egtads5kgzchxezkmbbrwp5cey