Positive-Type Photopolyimide Based on Vinyl Ether Crosslinking and De-Crosslinking

Tsunetomo Nakano, Hidefumi Iwasa, Nobukazu Miyagawa, Shigeru Takahara, Tsuguo Yamaoka
2000 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
A series of different acid value polyimides with carboxyl groups in the ends of main chain was synthesized and used for the three-component photopolymers, consisting of the polyimide, a vinyl ether monomer, and a photo-acid generator (PAG). This polyimide acts as a positive-type resist with the process of prebaking (PB), exposure to light, and post-exposure baking (PEB). The effect of the acid value correspond to molecular weight on the characteristics of the photopolyimide, such as sensitivity
more » ... and contrast, was investigated. An increase in the acid value and a decrease in the molecular weight enhance the increment of sensitivity based on solubilization rate by cleavage reaction. This positive-type photopolyimide showed a sensitivity of 137 mJ I cm2 and a gamma value of 2.9.
doi:10.2494/photopolymer.13.715 fatcat:w2qp37ehuvbhdc5krrfbts4lwy