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Positive-Type Photopolyimide Based on Vinyl Ether Crosslinking and De-Crosslinking
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
A series of different acid value polyimides with carboxyl groups in the ends of main chain was synthesized and used for the three-component photopolymers, consisting of the polyimide, a vinyl ether monomer, and a photo-acid generator (PAG). This polyimide acts as a positive-type resist with the process of prebaking (PB), exposure to light, and post-exposure baking (PEB). The effect of the acid value correspond to molecular weight on the characteristics of the photopolyimide, such as sensitivitydoi:10.2494/photopolymer.13.715 fatcat:w2qp37ehuvbhdc5krrfbts4lwy