Electron postgrowth irradiation of platinum-containing nanostructures grown by electron-beam-induced deposition from Pt(PF[sub 3])[sub 4]

A. Botman, C. W. Hagen, J. Li, B. L. Thiel, K. A. Dunn, J. J. L. Mulders, S. Randolph, M. Toth
2009 Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena  
The material grown in a scanning electron microscope by electron beam-induced deposition ͑EBID͒ using Pt͑PF 3 ͒ 4 precursor is shown to be electron beam sensitive. The effects of deposition time and postgrowth electron irradiation on the microstructure and resistivity of the deposits were assessed by transmission electron microscopy, selected area diffraction, and four-point probe resistivity measurements. The microstructure, notably the platinum nanocrystallite grain size, is shown to evolve
more » ... th electron fluence in a controllable manner. The resistivity was observed to decrease as a result of postgrowth electron irradiation, with the lowest observed value of 215Ϯ 15 ⍀ cm. The authors demonstrate that electron beam-induced changes in microstructure can be caused using electron fluences similar to those used during the course of EBID and suggest that the observed effects can be used to tailor the microstructure and functionality of deposits grown by EBID in situ without breaking vacuum.
doi:10.1116/1.3253551 fatcat:x3njs2pcvfgltao7ll63a57vt4