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Parallel computing and the generation of basic plasma data
1998
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Comprehensive simulations of the processing plasmas used in semiconductor fabrication will depend on the availability of basic data for many microscopic processes that occur in the plasma and at the surface. Cross sections for electron collisions, a principal mechanism for producing reactive species in these plasmas, are among the most important such data; however, electron-collision cross sections are difficult to measure, and the available data are, at best, sketchy for the polyatomic feed
doi:10.1116/1.580990
fatcat:3j2fyo2a5zfhdmpodxbamwh63u