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et al.. Effects of deep wet etching in HF/HNO_3 and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm. Abstract: We investigate the interest of deep wet etching with HF/HNO 3 or KOH solutions as a final step after polishing to improve fused silica optics laser damage resistance at the wavelength of 351 nm. This comparison is carried out on scratches engineered on high damage threshold polished fused silica optics. We evidence that both KOH anddoi:10.1364/oe.25.004607 pmid:28380732 fatcat:x3agcspnmng4bnhzjwbd2kpo7u