Tungsten Probe Tip Cleaning

Jehan Saujauddin, Tim Niemi, Ted Lundquist, Baohua Niu, Michael Cable
2020 Microscopy and Microanalysis  
Nanoprobing has become indispensable for the characterization of FEOL processes and FinFET performance in early process development and HVM yield improvements [1] [2] [3]. When the processes and transistor performance are fully characterized such as transistor level I-V curves (performance) and leakage (power efficiency), the risk to process development is greatly reduced, providing high impact to the HVM-product performances.
doi:10.1017/s1431927620022503 fatcat:a23esgy3d5bgbi6m57pbsxpqmq