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Testing of optical materials for 193-nm applications

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen K. Bates, Chris K. Van Peski, Philip T. C. Chen, William E. McClintock, Gary J. Rottman
1998 Optical Systems Contamination and Degradation  

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doi:10.1117/12.328512 fatcat:nd65attg7zdmtovfpy37dtz2ki
Citation

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen K. Bates, Chris K. Van Peski, Philip T. C. Chen, William E. McClintock, Gary J. Rottman. "Testing of optical materials for 193-nm applications." Optical Systems Contamination and Degradation (1998)