An optimal substrate design for SERS: dual-scale diamond-shaped gold nano-structures fabricated via interference lithography

Hyo-Jin Ahn, Pradheep Thiyagarajan, Lin Jia, Sun-I Kim, Jong-Chul Yoon, Edwin L. Thomas, Ji-Hyun Jang
2013 Nanoscale  
Experimental Procedure Chemicals used 4-aminothiophenol (Sigma-Aldrich, 97%), SU-8 2010 (microchem), 1-methoxy-2-propanol acetate (SAMCHUN,99%), (3-mercaptopropyl)-trimethoxysilane (Sigma-Aldrich,95%), acetone (Skchemicals,99.5%), isopropanol (Skchemicals 99.5%), ethanol (Fisher scientific,99.9%), chloroauric acid (Sigma-Aldrich, >99.9%), sodium citrate (Sigma-Aldrich, >98%), zinc nitrate hexahydrate (Sigma-Aldrich, >98%), hexamethylenetetramine (HMTA) (Sigma-Aldrich, >98%), sodium hydroxide
more » ... ksan pure chemicals) Ethanol, crystal violet(CV) (Sigma-Aldrich, >90%). All chemicals were used without further purification. Fabrication of DGN patterns via interference lithography The Si substrates were cleaned using ultra-sonication with acetone, isopropanol, and deionized water for 10 min and dried by nitrogen blowing. A 5nm Cr layer and 300 nm thick Au film was deposited by e-beam evaporator onto the Si substrate. In case of glass substrate, we Electronic Supplementary Material (ESI) for Nanoscale This journal is
doi:10.1039/c3nr33498h pmid:23381682 fatcat:aknmt5jvjzdzhmdauoxjwubnha