Experimental Procedure Chemicals used 4-aminothiophenol (Sigma-Aldrich, 97%), SU-8 2010 (microchem), 1-methoxy-2-propanol acetate (SAMCHUN,99%), (3-mercaptopropyl)-trimethoxysilane (Sigma-Aldrich,95%), acetone (Skchemicals,99.5%), isopropanol (Skchemicals 99.5%), ethanol (Fisher scientific,99.9%), chloroauric acid (Sigma-Aldrich, >99.9%), sodium citrate (Sigma-Aldrich, >98%), zinc nitrate hexahydrate (Sigma-Aldrich, >98%), hexamethylenetetramine (HMTA) (Sigma-Aldrich, >98%), sodium hydroxide

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... ksan pure chemicals) Ethanol, crystal violet(CV) (Sigma-Aldrich, >90%). All chemicals were used without further purification. Fabrication of DGN patterns via interference lithography The Si substrates were cleaned using ultra-sonication with acetone, isopropanol, and deionized water for 10 min and dried by nitrogen blowing. A 5nm Cr layer and 300 nm thick Au film was deposited by e-beam evaporator onto the Si substrate. In case of glass substrate, we Electronic Supplementary Material (ESI) for Nanoscale This journal is