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Pattern fidelity in nanoimprinted films using CD-SAXS
2005
Emerging Lithographic Technologies IX
The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. As a potential next generation lithography, NIL is capable of true nanofabrication, producing patterns of sub-10 nm dimensions. Routine production of nanoscale patterns will require new metrologies capable of non-destructive dimensional measurements of both the mold and the pattern with sub-nm precision. In this
doi:10.1117/12.600267
fatcat:ycjsw7qhxrasrf5e5ofo6tqctu