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The fabrication of an ion-exchanged waveguide beam deflector containing a photowritten grating is described. The planar waveguide was fabricated by thermal K' exchange in a borosilicate glass. The grating was written by photobleaching an absorption defect centered at 330 am, which was created by y-ray irradiation of the glass. The bleaching was accomplished with the 351-nm line from an argon laser. The device achieved 35% deflection efficiency at 633 nm, which corresponded to a grating with adoi:10.1364/ol.18.000808 pmid:19802280 fatcat:bhkrsffmqzgxpjq4v5wrhqqpom