Analysis of oxidation behavior in nanocrystal β-FeSi2/Si composites by rutherford backscattering spectrometry and computation of diffusion flux

Mikihiro Arima, Masaya Fuchi, Kazumasa Narumi, Yoshihito Maeda
2017 Proc. Asia-Pacific Conf. on Semiconducting Silicides and Related Materials 2016   unpublished
We have investigated oxidation behaviors of nanocrystal (NC) -FeSi2/Si composites by Rutherford Backscattering Spectrometry (RBS) and computation of diffusion fluxes. The oxidation is controlled by diffusion of the O flux from the surface and the Si flux toward the Matano-Boltzmann (M-B) interface. The time dependence of the location of the M-B interface was determined. We proposed a model for oxidation of the composite that is different from oxidation of Si controlled by O diffusion through
more » ... diffusion through SiO2 at the surface. Experiments Precursor samples including NC- (the average size less than 10nm) embedded in Si were synthesized by an ion beam synthesis (IBS) process. Oxidation of the sample was carried out at 900 o C in an electrical furnace JJAP Conf. Proc. , 011105 (2017) https://doi.
doi:10.7567/jjapcp.5.011105 fatcat:2yojjszpxze3bhiiekqgqxguum