A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2019; you can also visit the original URL.
The file type is application/pdf
.
Interaction between Atomic Vacancies in Crystalline Si Wafer: A Tight-binding Molecular Dynamics Study
2012
Transactions of the Materials Research Society of Japan
Vacancy interaction in crystalline Si wafer is studied by numerical simulation based on the Tight-Binding Molecular Dynamics (TBMD) method. We evaluate an effective interaction between vacancy pair in bulk and in a thin slab as model systems of a Si wafer. In the case of vacancy pair in bulk crystal, results reveal that there is an effective "capture radius" of the vacancies to form a divacancy at around 8Å at 300K and 13Å at 600K. Surface structure involving vacancies in Si slab undergoes a
doi:10.14723/tmrsj.37.143
fatcat:d3q3e4mrozelvp33pfsg4fbcqm