Process variation aware OPC with variational lithography modeling

Peng Yu, S.X. Shi, D.Z. Pan
2006 Proceedings - Design Automation Conference  
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional model-based OPC assumes nominal process parameters without considering process variations, due to prohibitive runtimes of lithography simulations across process windows. This is the first paper to propose a true process-variation aware OPC (PV-OPC) framework. It is enabled by the variational lithography modeling and
more » ... phy modeling and guided by the variational edge placement error (V-EPE) metrics. Due to the analytical nature of our models, our PV-OPC is only about 2-3× slower than the conventional OPC, but it explicitly considers the two main sources of process variations (dosage and focus) during OPC. Thus our post PV-OPC results are much more robust than the conventional OPC ones, in terms of both geometric printability and electrical characterization under process variations.
doi:10.1109/dac.2006.229324 fatcat:roxieqscjfflvowjw5ouk6eqa4