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This paper describes the realization of the integration of micro and nanoscale conformal structures. A new dry processing technique is used to create structures supported by a single high aspect ratio pillar support (SHARPS), creating submicron single crystal silicon features, with tight geometric control, attached to much larger (10-200µm) silicon dioxide platforms. The platforms have lithographically defined two dimensional shapes. The curvature of the platforms is adjusted through metaldoi:10.1115/imece2004-61992 fatcat:pq7akp3s7naorfzo2pk6vfdae4