Delay-Free Deprotection Approach to Robust Chemically Amplified Resist

Takashi Hattori, Akira Imai, Ryoko Yamanaka, Takumi Ueno, Hiroshi Shiraishi
1996 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
A delay-free deprotection approach has been developed that produces an environmentally robust chemically amplified positive resist. The acetal 1ethoxyethyl (lEE) group was found to be easily and completely deprotected in the presence of photogenerated acid at room temperature. This is attributed to the volatility of the reaction products. Utilizing this kind of acetal group, it is thus possible to produce a robust chemically amplified resist. A simple two-component chemically amplified positive
more » ... resist system composed of polyvinylphenol partially protected with 1-ethoxyethyl and a photoacid generator exhibited excellent lithographic performance without the addition of stabilizers.
doi:10.2494/photopolymer.9.611 fatcat:ahwo7tcxgjhnnawiohnc2watta