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Ta oxide (TaOx) is investigated as a resistive buffer layer for the growth of high-quality Co/Pt multilayers with perpendicular magnetic anisotropy (PMA). The Pt/(Co/Pt) 3 films grown on TaOx buffer layers exhibit stronger PMA than those grown on Pt buffer layers, and are of comparable quality to films grown on metallic Ta. The optimized multilayers with TaOx buffer layers remain out-of-plane magnetized for Co layer thicknesses up to 10 Å without introducing a metallic current-shunting path,doi:10.1063/1.3622613 fatcat:3emrsqmo4baulb4mpn4wmquona