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This paper presents a new approach for assessing the reliability of nanometer-scale devices prior to fabrication and a practical reliability architecture realization. A four-layer architecture exhibiting a large immunity to permanent as well as random failures is used. Characteristics of the averaging/thresholding layer are emphasized. A complete tool based on Monte Carlo simulation for a-priori functional fault tolerance analysis was used for analysis of distinctive cases and topologies. Adoi:10.1145/1228784.1228837 dblp:conf/glvlsi/StanisavljevicGSLG07 fatcat:fyou2ysafbakzddv4tgki5ikcq