Estimation of Young's Modulus of Resist Pattern by using Atomic Force Microscope

Akira Kawai, Yoshihisa Kaneko
2001 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
doi:10.2494/photopolymer.14.731 fatcat:mnhrwlnvurgmhiaplkio3lrwn4