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Maskless photolithography: Embossed photoresist as its own optical element
1998
Applied Physics Letters
Preserved Fulltext
This letter demonstrates that features embossed on the surface of a layer of photoresist can direct UV light in the photoresist layer. These topographical features act as optical elements: they focus/ disperse and phase shift incident light in the optical near field, inside the resist layer. A number of different surface topographies have been examined, which give 50-250 nm features after exposure and development. This method gives patterns of complex features over large areas, in a parallel
doi:10.1063/1.122621
fatcat:alfeke7ixzh2dhvv2nsayfdr2e