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Quasi 3-D Velocity Saturation Model for Multiple-Gate MOSFETs
2007
IEEE Transactions on Electron Devices
This paper presents a quasi-3-D velocity saturation model for a multiple-gate MOSFET based on a calculation of Gauss's equation. A new and compact velocity saturation region length is derived from a simple approximation of the electric field distribution in the pinchoff region. It is found that the length of the velocity saturation region increases with the increment of gate length and fin width. This new model is used to derive an analytical expression of a substrate current for a trigate
doi:10.1109/ted.2007.894595
fatcat:vovdjr44knaqvlegx3jatkoiay