Resistive hose instability for arbitrary skin depth

David H Whittum
1997 Journal of Physics D: Applied Physics  
Resistive hose growth for moderate or large skin-depth differs from that derived from a conductivity model. Asymptotic growth is calculated for the Bennett equilibrium, incorporating the inductive component in the plasma return current, with phase-mixing accounted for via the "distributedmass" model. Analytic scalings are checked with numerical solutions of the linearized model. For a ratio of skin-depth to beam radius less than 1/10 the conductivity model appears quite adequate. When this ratio exceeds 1/4 inductive corrections appear.
doi:10.1088/0022-3727/30/6/014 fatcat:z3vpxgiskbfwlhewelstecqwsa