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Preparation of PbTiO3 Thin Films by Liquid Source Misted Chemical Vapor Deposition (LSMCVD) Method
2006
Journal of the Ceramic Society of Japan
The ferroelectric PbTiO 3 PT thin films were deposited on MgO100 and Si001 substrates by Liquid Source Mist Chemical Vapor Deposition LSMCVD method. The PbDPM 2 and TiiOC 3 H 7 4 TTIP were used as metal sources. Metal-organic sources were dissolved in 2-metoxyethanol. The PT thin films have h00 and 00l preferred orientations at lower metal source concentrations on MgO100 substrate. The epitaxial PT thin film could be prepared on MgO100 substrate at 0.02 molL solution at 600c C. The epitaxial PT
doi:10.2109/jcersj.114.603
fatcat:6nwb4ihggrfevhm2ymr6q5wsqq