Low-loss one-dimensional photonic bandgap filter in (110) silicon

Ariel Lipson, Eric M. Yeatman
2006 Optics Letters  
A free-space silicon one-dimensional photonic bandgap optical filter is designed and fabricated. A two-stage (110) wafer etching process is employed to form the extremely vertical, smooth, and high-aspect-ratio features that are essential for good optical properties. The ͗111͘ oriented planes of the wafer form Ͻ0.01°offvertical trenches that make up the Fabry-Perot filter. A simulation model is presented that analyzes the effect of verticality and predicts the measured spectrum well.
doi:10.1364/ol.31.000395 pmid:16480220 fatcat:3364xx4i7zfxrpzq4pzy76u4mm