Evaluation of Sputtered Films Using Mo Targets Prepared by the SPS Technique
방전플라즈마 소결법에 의해 제조된 Mo 타겟의 스퍼터링 특성평가

Jun-Mo Yang, Min Jung Kim, Jung Ho Yoo, Shil Sung Jeong, Ik Hyun Oh, Hyun Kuk Park, Kap Ho Lee
2013 Korean Journal of Metals and Materials  
The microstuructural properties and electrical characteristics of sputtering films deposited with Mo targets prepared by commercial hot isostatic pressing (HIP) and spark plasma sintering (SPS) were compared and analyzed. The analysis results revealed that the Mo films obtained from the SPS Mo targets had a quite similar resistivity and microstructure as the commercial HIP ones. Further, characteristics of the Mo films according to the sputtering conditions were investigated by XRD, SIMS and
more » ... by XRD, SIMS and TEM techniques. Such films are expected to be used as electrode materials for display/solar cell devices. † (
doi:10.3365/kjmm.2013.51.8.571 fatcat:yu2cq6z7vjagtlnabkjksm7yvi