Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas

H. C. M. Knoops, E. Langereis, M. C. M. van de Sanden, W. M. M. Kessels
2012 Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films  
Knoops, H.C.M.; Langereis, E.; van de Sanden, M.C.M.; Kessels, W.M.M.
doi:10.1116/1.3625565 fatcat:rorxmj45rvg4zlzgtqoc5gjpuq