Internet Archive Scholar

低圧MOCVD法によるZnTeのエピタキシャル成長 : エピタキシーII

小川 博司, 西尾 光弘, 伊藤 栄彦
1987 Journal of the Japanese Association for Crystal Growth  

Preserved Fulltext

fulltext thumbnail
Web Archive Capture PDF (154.2 kB)
https://web.archive.org/web/20220515070347/https://www.jstage.jst.go.jp/article/jjacg/14/1/14_KJ00000856255/_pdf

A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2022; you can also visit the original URL. The file type is application/pdf.

doi:10.19009/jjacg.14.1_53 fatcat:z52smqqne5ee7ltcvcwc3ymfuy
lang:ja
Citation

小川 博司, 西尾 光弘, 伊藤 栄彦. "低圧MOCVD法によるZnTeのエピタキシャル成長 : エピタキシーII." Journal of the Japanese Association for Crystal Growth 14.1 (1987) 53