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Thin films of Al 2 O 3 with embedded Cu and Ag nanoparticles (NPs) are deposited by r.f. co-sputtering on glass substrates. The samples are annealed at 400 0 C and 500 0 C for 3 h in forming gas (N 2 +5% H 2 ) to stimulate Cu and Ag nanoclusters' formation. Multilayer structures (stacks) such as are deposited on glass substrate by consequently sputtering of the individual layers. Before deposition of the capping layers of Al 2 O 3 and ZnO:Al, the bi-layer structures are annealed in vacuum fordoi:10.1088/1742-6596/398/1/012017 fatcat:wvj3m5rbjrfc5ltiocbvcres6m