A combination of electron-and ion-beam lithographies has been applied to fabricate patterns of plasmonic nanoparticles having tailored optical functions: they create hot-spots at predefined locations on the nanoparticle at specific wavelengths and polarizations of the incident light field. Direct inscribing of complex chiral patterns into uniform nano-disks of sub-wavelength dimensions, over extensive 20-by-20 µm 2 areas, is achieved with high fidelity and efficiency; typical groove widths are

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... n 10-30 nm range. Such patterns can perform optical manipulation functions like nano-tweezing and chiral sorting. Fabrication procedures can be optimized to pattern thin 0.1-2.5 µm-thick membranes with chiral nanoparticles having sub-15 nm grooves. Peculiarities of optical force and torque calculations using finite-difference time-domain method are presented. Downloaded From: http://proceedings.spiedigitallibrary.org/ on 10/03/2016 Terms of Use: http://spiedigitallibrary.org/ss/termsofuse.aspx Proc. of SPIE Vol. 8613 861304-2 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 10/03/2016 Terms of Use: http://spiedigitallibrary.org/ss/termsofuse.aspx Proc. of SPIE Vol. 8613 861304-3 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 10/03/2016 Terms of Use: http://spiedigitallibrary.org/ss/termsofuse.aspx Proc. of SPIE Vol. 8613 861304-6 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 10/03/2016 Terms of Use: http://spiedigitallibrary.org/ss/termsofuse.aspx