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Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
A combination of electron-and ion-beam lithographies has been applied to fabricate patterns of plasmonic nanoparticles having tailored optical functions: they create hot-spots at predefined locations on the nanoparticle at specific wavelengths and polarizations of the incident light field. Direct inscribing of complex chiral patterns into uniform nano-disks of sub-wavelength dimensions, over extensive 20-by-20 µm 2 areas, is achieved with high fidelity and efficiency; typical groove widths aredoi:10.1117/12.2002281 fatcat:2fmpe5fb5vdxxjon5dqllh3vje