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The effect of laser irradiation on electrical and structural properties of ZnO thin films
2013
Iranian Journal of Physics Research
In this paper, ZnO thin film was prepared by sol-gel process on glass substrates. The deposited films were dried at 100 and 240 ˚C and then annealed at 300, 400 and 500 ˚C. The two-probe measurement showed that resistance of as-prepared films is very high. The KrF excimer (λ=248 nm) laser irradiation with 1000 pulses, frequency of 1 Hz and 90 mJ/cm2 energy on surface of film resulted in the reduction of the films electrical resistance. X-ray diffraction (XRD) patterns confirmed the improved
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