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Study of a novel ALD process for depositing MgF2 thin films
2007
Journal of Materials Chemistry
Magnesium fluoride is an ultraviolet (UV) transparent material which is widely used in optical applications over a wide wavelength range. We have developed a novel atomic layer deposition (ALD) process for depositing magnesium fluoride thin films for the first time. MgF 2 films were grown at 250-400 uC using Mg(thd) 2 and TiF 4 as precursors. The crystallinity, morphology, composition, thicknesses and refractive indices of the films were analyzed by X-ray diffraction/ reflection (XRD/XRR),
doi:10.1039/b710903b
fatcat:454tdmos2zezflcg5p4uv4jt2q