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A holographic phase-shifting interferometer technique to measure in-plane distortion
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
We describe the use of holographic phase-shifting interferometry ͑HPSI͒ to measure in-plane distortion of a substrate in which a shallow grating, produced by interferometric lithography, has been etched. The diffractive metrology inherent in HPSI should enable one to study process-induced distortions down to the level of a few nanometers. We used HPSI to investigate distortion introduced by the anodic bonding of silicon nitride membranes to Pyrex frames in x-ray lithography masks. This was partdoi:10.1116/1.591049 fatcat:uyhwcflsw5dvngskb7yjluglpi