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RESEARCH OF FORMATION PROCESS OF SUBMICRON ELEMENTS OF OPTOELECTRONIC DEVICES CONSIDERING INFORMATION PROTECTION REQUIREMENTS
ИССЛЕДОВАНИЕ ПРОЦЕССА ФОРМИРОВАНИЯ СУБМИКРОННЫХ ЭЛЕМЕНТОВ ОПТОЭЛЕКТРОННЫХ УСТРОЙСТВ С УЧЕТОМ ТРЕБОВАНИЙ ПО ЗАЩИТЕ ИНФОРМАЦИИ
2019
Interexpo GEO-Siberia
ИССЛЕДОВАНИЕ ПРОЦЕССА ФОРМИРОВАНИЯ СУБМИКРОННЫХ ЭЛЕМЕНТОВ ОПТОЭЛЕКТРОННЫХ УСТРОЙСТВ С УЧЕТОМ ТРЕБОВАНИЙ ПО ЗАЩИТЕ ИНФОРМАЦИИ
In this paper, the term «hardware tab» is reviewed, critical stages of chip production on which tabs can occur are indicated, the possible consequences of tab activation are described. Also a method is described that does not allow the appearance of tabs, as an example of import substitution. The developed technological mode of submicron elements obtaining is shown, by the example of a polysilicon layer.
doi:10.33764/2618-981x-2019-6-1-108-114
fatcat:aay5pykwmjddvndatsbfin56iu