Oxide interface engineering for sandwich-type high-Tc SIS Josephson junction
高温超伝導体積層型SISジョセフソン接合と酸化物界面工学

Masashi KAWASAKI, Eiji FUJIMOTO, Ryuta TSUCHIYA, Mikk LIPPMAA, Hiroshi SATO, Hiroshi AKOH, Hideomi KOINUMA
1999 Oyobuturi  
doi:10.11470/oubutsu1932.68.391 fatcat:osjryowekna4niog6f4jx3brsy