A Highly Selective Low Pressure Inductively Coupled Plasma Etching Process for GaAs Using Photoresist Mask

D.S. Rawal
2011 The Open Plasma Physics Journal  
GaAs etch characteristics like etch rate, etch profile sidewall angle, etch surface morphology and selectivity are studied as a function of Inductively Coupled Plasma (ICP) power and Cl 2 /BCl 3 flow rate ratio in ICP at low pressure (<15mTorr) and low RF bias power (<100W) regime to achieve moderate GaAs etch rate with an-isotropic profiles and smooth surface morphology. The low pressure regime etching at Cl 2 /BCl 3 flow rate ratio of 4:1 has resulted in vertical etch profiles with controlled
more » ... sidewall angle ~ 84º, smooth surface morphology and good mask selectivity ~15 without significant deposition of CCl x polymer on the etched sidewalls but with limited etch depth ~ 100μm using photoresist mask. The mask selectivity is found to be a strong function of RF bias power and ICP power and a weaker function of process pressure. The resultant etch depth increases with an increase in pressure and flow rate ratio at the expense of etch surface morphology, as the desorption of chemical species limits the etching process at higher Cl 2 flow rates and leaves some of the residue on the surface. © Rawal et al.; Licensee Bentham Open. This is an open access article licensed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0/) which permits unrestricted, non-commercial use, distribution and reproduction in any medium, provided the work is properly cited.
doi:10.2174/1876534301104010034 fatcat:wpvm3amfm5hxbas2dsg2n2phba