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A silicon nanochannel system with integrated transverse electrodes was designed and fabricated by combining MEMS microfabrication and AFM nanolithography. The fabrication process began with the patterning of microscale reservoirs and electrodes on an oxidized silicon chip using conventional MEMS techniques. A nanochannel, approximately 30 m long with a small semi-circular cross-sectional area of 20nm by 200nm, was then mechanically machined on the oxide surface between the micro reservoirs bydoi:10.1049/iet-nbt.2011.0007 pmid:22149865 fatcat:hb6eqwlkf5ckvn25yxeteykjvy