A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2020; you can also visit the original URL.
The file type is application/pdf
.
Resist and Transfer Free Patterned CVD Graphene Growth on ALD Molybdenum Carbide Nano Layers
2019
Zenodo
Multilayer graphene (MLG) films were grown chemical vapour deposition (CVD) on molybdenum carbide (MoCx) substrates. We fabricated the catalytic MoCx films by plasma enhanced atomic layer deposition. The mechanism of graphene growth is studied and analysed for amorphous and crystalline MoCx films. In addition, we present a complete bottom up patterned graphene growth (GG) on pre-patterned MoCx ALD performed at 50ºC. Selective CVD GG eliminates the need to pattern or transfer the graphene film
doi:10.5281/zenodo.3551466
fatcat:4lpjpbqb2reddfobawlfz3elbe