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A series of microcrystalline silicon nϪiϪ p solar cells has been deposited by very high frequency plasma enhanced chemical vapor deposition at various values of silane to hydrogen source gas ratio and on two different substrate types. Relationships between microstructure and electrical characteristics of these solar cells are investigated by transmission electron microscopy, atomic force microscopy, and I(V) measurements. A mixed phase ͑so-called heterophase͒ layer consisting of amorphous plusdoi:10.1063/1.1562746 fatcat:vjcdpf5dfnebbcvs6v3jark4c4