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Dependence of deposition conditions on amorphous SiC:H thin films prepared by magnetron sputtering method using CH4
CH4を用いたマグネトロンスパッタ法によって作製したアモルファスSiC:H薄膜の作製条件依存性
1987
Shinku
CH4を用いたマグネトロンスパッタ法によって作製したアモルファスSiC:H薄膜の作製条件依存性
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