Diversion of Exposure Technology, Born from Development of Spherical Semiconductor. The Maskless Exposure Apparatus

Akihito Ishikawa
2002 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
doi:10.2494/photopolymer.15.707 fatcat:u3dztumdojeb5osjqib5cxbioa