A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2016; you can also visit the original URL.
The file type is
High brightness inductively coupled plasma source for high current focused ion beam applications
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
A high brightness plasma ion source has been developed to address focused ion beam ͑FIB͒ applications not satisfied by the liquid metal ion source ͑LMIS͒ based FIB. The plasma FIB described here is capable of satisfying applications requiring high mill rates ͑Ͼ100 m 3 / s͒ with non-gallium ions and has demonstrated imaging capabilities with sub-100-nm resolution. The virtual source size, angular intensity, mass spectra, and energy spread of the source have been determined with argon and xenon.doi:10.1116/1.2366617 fatcat:mxyi52c4mrdg3hverar47abcvy