Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers

Jordan Bouaziz, Pedro Rojo Romeo, Nicolas Baboux, Raluca Negrea, Lucian Pintilie, Bertrand Vilquin
2019 APL Materials  
doi:10.1063/1.5110894 fatcat:wvm4qhruobatdk6c7kbtyynalq