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Application for WLP at positive working photosensitive polybenzoxazole
2002
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
We have developed a positive working photosensitive polybenzoxazole(PBO) for semiconductor surface coating material. Now it has already been used for buffer coat to protect electrical circuit on IC chip in the semiconductor market. Cure film of this photosensitive PBO has not only low water absorption (0.3%) and low dielectric constant (2.9) but also high adhesion to substrate such as Si02 etc. And the patterning profile has suitable taper shape after development and curing. These properties
doi:10.2494/photopolymer.15.173
fatcat:xwalfpmrwnhtldnxwy67mfg6re