Application for WLP at positive working photosensitive polybenzoxazole

Kagehisa Yamamoto, Takashi Hirano
2002 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
We have developed a positive working photosensitive polybenzoxazole(PBO) for semiconductor surface coating material. Now it has already been used for buffer coat to protect electrical circuit on IC chip in the semiconductor market. Cure film of this photosensitive PBO has not only low water absorption (0.3%) and low dielectric constant (2.9) but also high adhesion to substrate such as Si02 etc. And the patterning profile has suitable taper shape after development and curing. These properties
more » ... useful for application of interlayer dielectric film for Multi Chip Module (MCM ) package and Wafer Level Package(WLP).
doi:10.2494/photopolymer.15.173 fatcat:xwalfpmrwnhtldnxwy67mfg6re