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Novel photo-patterning technology for direct writing in resist based systems
[thesis]
2010
This thesis presents studies on micro-patterning techniques and their applications in direct writing of photoresist based systems. Gallium nitride based ultraviolet light sources, micro-pixelated light emitting diodes and laser diodes, are utilised in photolithography systems. Laser direct writing is used to pattern negative-type photoresist and resist based nanocomposites with an organic light-emitting oligomer, oligofuorene-functionalised truxenes, added. Characteristics of such structures
doi:10.48730/1yfk-ac83
fatcat:ndanbtlmmngfffx7mxffcoqbvm